SKIN1004 Madagascar Centella Poremizing Quick Clay Stick Mask 75g

Centella Asiatica Extract (500 ppm)
Centella Asiatica contains active ingredients such as madecassic acid and asiaticoside, which aid in collagen synthesis, promoting excellent wound healing and skin regeneration. It also has soothing properties that help in trouble care. Additionally, it protects the skin from free radicals and revitalizes tired skin.

Kaolin (180,000 ppm), Bentonite (1 ppm), Illite (0.75 ppm), Montmorillonite (0.06 ppm)
A combination of four mud components that absorb excess sebum from the skin and help remove impurities.

Aloe Barbadensis Leaf Extract (10,000 ppm)
Supplies moisture to the skin.